New plasma trick could unlock smaller, more powerful computer chips
Researchers have developed a new plasma-based technique to selectively remove atoms from ultrathin transition metal dichalcogenide (TMD) materials. By using oxygen or fluorine pretreatment, they can safely modify these materials to create more powerful and smaller computer chips.
Why it matters
This breakthrough addresses the physical limitations of silicon, potentially enabling the next generation of high-performance, energy-efficient electronics.
Silicon has powered computer chips for decades, but engineers are increasingly running into the material's physical limits. To keep making electronics smaller and more powerful, researchers are investigating ways to combine silicon with new ultrathin materials.
The article reports on scientific research findings in a neutral, informative manner.
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