Krypton gas emerges as a new ingredient for quantum computing

Cornell University researchers have developed a method using krypton gas to deposit tantalum thin films at significantly lower temperatures. This breakthrough makes tantalum more viable for use in quantum computing microchips by aligning with standard industrial nanofabrication processes.
Why it matters
Lowering the manufacturing temperature of high-performance materials like tantalum is a critical step toward the commercial scalability of quantum computing hardware.
edited by Lisa Lock , reviewed by Robert Egan
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Add as preferred source A team led by Valla Fatemi, assistant professor in the School of Applied and Engineering Physics in Duffield Engineering, developed a method that uses krypton gas to slash the deposition temperature of the corrosion-resistant metal tantalum, resulting in thin films that have substantially higher electronic conductivity. Credit: Bridget Reinsko To commercialize quantum computing, manufacturers need high-quality superconducting materials for microchips, but they also require a reliable, sustainable nanofabrication process. Tantalum is a corrosion-resistant metal that meets the first criterion but not the second. That's because it has to be deposited on a substrate at temperatures that typically exceed 400°C (752°F)—too hot for many semiconductor foundries' current tools.
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