Article may be outdated

This article is 53 days old. Some details may have changed since publication.

The Hindu·2 min read·hard

IIT-Hyderabad, University of Hyderabad joint team granted patent for nanomaterial fabrication

T
The Hindu Bureau
IIT-Hyderabad, University of Hyderabad joint team granted patent for nanomaterial fabrication
AI Summary

Researchers from IIT-Hyderabad and the University of Hyderabad have patented a new method for fabricating thin nanomaterials using femtosecond laser ablation. This technique is described as a faster and more cost-effective way to produce TMDC nanosheets.

Why it matters

This innovation could significantly advance the development of next-generation electronics and photonics by making material production more scalable.

Dive DeeperCreate a free account to unlock

Researchers from the University of Hyderabad (UoH) and the Indian Institute of Technology (IIT)-Hyderabad have secured patent for a novel method to fabricate thin transition metal dichalcogenide (TMDC) nanosheets using Bessel beam femtosecond laser ablation.

Continue reading on Headlinne

Create a free account to read the full article.

Read full article →
sciencetechnology
Political Bias
Center
LeftLean LCenterLean RRight
Confidence: 90%

The article reports on a scientific achievement based on a university press release without bias.

Get smarter about the news

Sign up free for a feed built around what you actually care about, Dive Deeper research on any story, and the full text of every article.

Create free account

Already have an account? Sign in